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AMAT 0021-53986 Upper Chamber Liner

Original price was: $1,360.00.Current price is: $1,185.00.

The AMAT 0021-53986 is a high-purity aluminum nitride (ALN) upper chamber liner, purpose-built for AMAT ENCORE 2 platform 300mm wafer plasma etching and deposition systems. It acts as a critical protective barrier against harsh plasma environments, minimizing process contamination, controlling chamber surface properties, and ensuring stable, high-yield semiconductor manufacturing performance.

SKU: 0021-53986 Category:
Description
Parameter Details
Model 0021-53986
Manufacturer Applied Materials (AMAT)
Product Type Upper Chamber Liner
Core Material High-Purity Aluminum Nitride (ALN)
Compatible Platform AMAT ENCORE 2 Series 300mm Wafer Processing Systems
Wafer Size Compatibility 300mm
Operating Temperature Range -20°C to +150°C
Storage Temperature Range -40°C to +85°C
Outer Diameter 380mm
Inner Diameter 320mm
Height 120mm
Net Weight 4.2kg
Thermal Conductivity ≥180 W/(m·K)
Dielectric Strength ≥15 kV/mm
Volume Resistivity ≥10¹⁴ Ω·cm
Protection Rating IP40
Mounting Location Upper Section of ENCORE 2 Process Chamber
Key Performance Features High Plasma Erosion Resistance, Low Particle Generation,
Excellent Thermal Uniformity
Compliance Certifications SEMI S2 Compliant, RoHS Certified
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