$1,360.00 Original price was: $1,360.00.$1,185.00Current price is: $1,185.00.
The AMAT 0021-53986 is a high-purity aluminum nitride (ALN) upper chamber liner, purpose-built for AMAT ENCORE 2 platform 300mm wafer plasma etching and deposition systems. It acts as a critical protective barrier against harsh plasma environments, minimizing process contamination, controlling chamber surface properties, and ensuring stable, high-yield semiconductor manufacturing performance.
| Parameter | Details |
|---|---|
| Model | 0021-53986 |
| Manufacturer | Applied Materials (AMAT) |
| Product Type | Upper Chamber Liner |
| Core Material | High-Purity Aluminum Nitride (ALN) |
| Compatible Platform | AMAT ENCORE 2 Series 300mm Wafer Processing Systems |
| Wafer Size Compatibility | 300mm |
| Operating Temperature Range | -20°C to +150°C |
| Storage Temperature Range | -40°C to +85°C |
| Outer Diameter | 380mm |
| Inner Diameter | 320mm |
| Height | 120mm |
| Net Weight | 4.2kg |
| Thermal Conductivity | ≥180 W/(m·K) |
| Dielectric Strength | ≥15 kV/mm |
| Volume Resistivity | ≥10¹⁴ Ω·cm |
| Protection Rating | IP40 |
| Mounting Location | Upper Section of ENCORE 2 Process Chamber |
| Key Performance Features | High Plasma Erosion Resistance, Low Particle Generation, Excellent Thermal Uniformity |
| Compliance Certifications | SEMI S2 Compliant, RoHS Certified |

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