$1,960.00 Original price was: $1,960.00.$1,170.00Current price is: $1,170.00.
The AMAT 0100-71275 is a high-precision gas distribution component designed for AMAT Centura® and Endura® series semiconductor etching and CVD/ALD deposition systems, delivering uniform process gas flow into the process chamber to ensure consistent and high-quality wafer fabrication performance.
| Parameter | Details |
|---|---|
| Model | 0100-71275 |
| Manufacturer | Applied Materials (AMAT) |
| Product Type | High Precision Gas Distribution Component |
| Compatible Equipment | AMAT Centura®, Endura® Series Semiconductor Etching & CVD/ALD Deposition Systems |
| Compatible Wafer Size | 200mm / 300mm |
| Core Material | Anodized Aluminum, Quartz, Ceramic-Coated 316L Stainless Steel |
| Outer Diameter | 380 mm |
| Thickness | 25 mm |
| Net Weight | 6.5 kg |
| Single Channel Gas Flow Range | 10 sccm to 1000 sccm |
| Operating Temperature Range | 50°C to 500°C |
| Operating Pressure Range | Atmospheric pressure to 10⁻⁶ Torr (high vacuum) |
| Compatible Gases | Inert (Ar, N₂), Reactive (SiH₄, O₂, NH₃), Corrosive (Cl₂, CF₄, WF₆) Gases |
| Control Interface | Integrated with equipment PLC for automated flow/pressure adjustment |
| Protection Rating | IP40 |
| Mounting Method | Chamber internal fixed installation |
| Compliance Certifications | SEMI S2 Compliant, RoHS Certified |

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